2017.7-2020.9 中芯国际上海集成电路有限公司

2024.7-2025.4 中国工程物理研究院电子工程研究所

2025.4-至今 无锡学院

CMOS集成电路设计、半导体材料

[1] Yan Teng, Kun Tang*, et al, “High efficiency of boron doping and fast growth realized with a novel gas inlet structure in diamond microwave plasma chemical vapor deposition system”, Carbon Lett. 34, 1115 (2024).

[2] Yan Teng, Kun Tang*, et al, “Substrate Temperature Dependence of the Contribution Rate of Nitrogen to Diamond Growth by Microwave Plasma CVD”, Diamond Relat. Mater. 146, 111181 (2024).

[3] Yan Teng, Kun Tang*, et al, “The regulation mechanism of oxygen additives on diamond growth and residual boron by microwave plasma chemical vapor deposition”, Diamond Relat. Mater. 160, 113065 (2025).